• Plasma Enhanced Chemical Vapor Deposition System

Plasma Enhanced Chemical Vapor Deposition System

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$25000.00 / piece
Quantity: - + 1items available

Heat Module

Max. Temp.: 1200oC

Heating Zone: 270 mm

Constant Heating Zone: 100 mm

Tube Size: 60 mm (dia) x 1250 mm (lenght)

RF Power Module

Output Power: 0 - 300 W 

Stability: +/- 0.1%

Frequency: 13.56 MHz

Max. Reverse Power: 120 W

Vacuum Module

< 50 Pa for low vacuum module

< 1 Pa for medium vacuum module

< 0.005 Pa for high vacuum module

Gas Mixing Module

up to 4 channels with digital displayed mass flow meter 

Gas Flow Range: 0 - 200 sccm

Gas Flow Accuracy: +/- 1.5% F.S.

Temperature Control

PID Control - self-tuning

30 Segments Program

N-type Thermal Couple

Temperature Accuracy: +/- 1oC


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